Nicolas Boscher

Advanced Plasma and Vapor Deposition Processes

Our research group develops a fundamental and technological expertise on “plasma-matter interactions” and "advanced vapor deposition processes” to define, design and develop new processes and prototypes. Our technologies, currently articulated around i) plasma surface treatment, ii) plasma-enhanced chemical vapor deposition (PECVD), iii) oxidative chemical vapor deposition (oCVD), iv) physical vapor deposition (PVD) and v) high-temperature chemical vapor deposition (HTCVD), bring LIST to the forefront of research and technology in the area of coatings and surface engineering.