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ProductUpdated on 17 January 2025

HDRF Technology

Thierry Lazerand

General Manager at Plasma-Therm Europe

Grenoble, France

About

Our Odyssey and Kayen HDRF systems offers efficient, scalable lab-to-fab configurations for resist stripping, polymer removal, sacrificial film etching, and surface modification

Kayen HDRF is a unique plasma-based system for photoresist removal and wafer surface treatment. It’s the most efficient and cost-effective system available for microelectronics manufacturing today.

Unlike conventional photoresist strip systems, we utilize High-Density Radical Flux (HDRF) technology which produces high concentrations of reactive radicals, without charged particles or unwanted photons. This chemical (non-physical), non-damaging plasma is ideal for conventional and low-temperature applications..

Primary Applications

  • Low-temperature (50˚C to 150˚C) photoresist removal

  • High-rate (150˚C to 250˚C) photoresist removal

  • Surface organic cleaning

  • Sacrificial polymer release for MEMS devices

Looking for

  • R&D

Applies to

  • Aeronautics/Space
  • Biomedical (orthopedics, dental…)
  • Electronics
  • Jewelry/Watch making
  • Special machines
  • Others

Organisation

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