ProductUpdated on 17 January 2025
HDRF Technology
About
Our Odyssey and Kayen HDRF systems offers efficient, scalable lab-to-fab configurations for resist stripping, polymer removal, sacrificial film etching, and surface modification
Kayen HDRF is a unique plasma-based system for photoresist removal and wafer surface treatment. It’s the most efficient and cost-effective system available for microelectronics manufacturing today.
Unlike conventional photoresist strip systems, we utilize High-Density Radical Flux (HDRF) technology which produces high concentrations of reactive radicals, without charged particles or unwanted photons. This chemical (non-physical), non-damaging plasma is ideal for conventional and low-temperature applications..
Primary Applications
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Low-temperature (50˚C to 150˚C) photoresist removal
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High-rate (150˚C to 250˚C) photoresist removal
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Surface organic cleaning
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Sacrificial polymer release for MEMS devices
Looking for
- R&D
Applies to
- Aeronautics/Space
- Biomedical (orthopedics, dental…)
- Electronics
- Jewelry/Watch making
- Special machines
- Others
Organisation
Similar opportunities
Product
- Naval
- Others
- Optical
- Electronics
- Aeronautics/Space
- Telecommunication
- Energy/Environment
- Industrial equipment
- Jewelry/Watch making
- Biomedical (orthopedics, dental…)
Khashayar Khazen
Technology development manager at Microcertec
Collégien, Ile-de-France, France
Service
surface finishing and performance
- Energy
- Health
- Defence
- Subcontracting
- Aeronautics/Space
- Electronics/Photonics
- Luxury, creation & crafts
Frédéric BAJARD
Group C.O.O at Binc Industries
Saint-Priest, France
Service
- Other
- Energy transition
- Advice and/or Services
ERIC BEGUE
Dirigeant at BPCH
Bagnères de Bigorre, France